发明名称 ウエーハの加工方法
摘要 PROBLEM TO BE SOLVED: To provide a method for processing a wafer, capable of enabling a street-reduction, simplifying steps, and surely breaking an adhesive sheet.SOLUTION: A method comprises: a modified layer forming step of forming a modified layer along a predetermined division line by irradiating a wafer 11 with a laser beam that penetrates the wafer 11; a protective member arranging step of arranging the protective member on a surface of the wafer 11; a grinding step of grinding a rear surface of the wafer 11 to thin the wafer to a predetermined thickness and dividing the modified layer into individual chips 27 at a division starting point; a sheet adhering step of adhering an adhesive sheet 29 that is cured by the irradiation with ultraviolet to the rear surface of the wafer 11, adhering a pressure sensitive adhesive sheet T on the adhesive sheet and removing the protective member arranged on the surface; an ultraviolet irradiating step of irradiating with the ultraviolet to cure and break the adhesive sheet 29 to break the wafer along the chips; and a pick-up step of picking up individual chips in which the adhesive sheet 29 is adhered to its rear surface from the place above the pressure sensitive adhesive sheet T.
申请公布号 JP6029347(B2) 申请公布日期 2016.11.24
申请号 JP20120142976 申请日期 2012.06.26
申请人 株式会社ディスコ 发明人 台井 暁治;杉谷 哲一;小林 義和
分类号 H01L21/301;B23K26/40;H01L21/304;H01L21/52 主分类号 H01L21/301
代理机构 代理人
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