发明名称 PLASMA TREATMENT CHAMBER
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment chamber which can detect the state of particles inside a container regardless of the pressure in the container. SOLUTION: The plasma treatment chamber 10 comprises a chamber 11, gas introduction shower head 34, susceptor 12 for applying high-frequency power to a treatment space S, exhaust unit for exhausting a gas out of the chamber 11, particle counter 45, and buffer plate 14 for partitioning the chamber 11 into a reaction chamber 17 and a manifold 18. The exhaust unit includes a roughing exhaust pipe 54 and a full-fledged exhaust pipe 55. The roughing exhaust pipe 54 and the full-fledged exhaust pipe 55 include a roughing exhaust port 56 and a full-fledged exhaust port 57, respectively, both of which are opened in the manifold 18. The roughing exhaust port 56 and the full-fledged exhaust port 57 are arranged adjacent to each other, and are opened toward a passage wherein particles fall freely. The particle counter 45 is arranged inside the manifold 18, and a laser emitter 47 of the particle counter 45 emits laser light for inspection along the arrangement direction of the roughing exhaust port 56 and full-fledged exhaust port 57. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007103465(A) 申请公布日期 2007.04.19
申请号 JP20050288356 申请日期 2005.09.30
申请人 TOKYO ELECTRON LTD 发明人 TSUJIMOTO HIROSHI
分类号 H01L21/3065;C23C16/44 主分类号 H01L21/3065
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