发明名称 SUBSTRATE TREATMENT DEVICE, PEELING METHOD FOR LAMINATED SUBSTRATE, AND METHOD FOR REMOVING ADHESIVE
摘要 The embodiment of a substrate treatment device includes a treatment bath configured to store a treatment liquid in which a treatment object is to be immersed, a transport section configured to transport the treatment object, a temperature control section provided in at least one of the treatment bath and a position spaced from the treatment bath and configured to perform at least one of heating and cooling of the treatment object. the treatment object is at least one of:a laminated substrate including a device substrate, a support substrate, and an adhesive provided between the device substrate and the support substrate,the device substrate with the adhesive attached thereto, andthe support substrate with the adhesive attached thereto.
申请公布号 US2016225613(A1) 申请公布日期 2016.08.04
申请号 US201415021182 申请日期 2014.09.24
申请人 SHIBAURA MECHATRONICS CORPORATION 发明人 Kanai Takahiro;Matsui Emi;Hayashi Konosuke
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项 1. A substrate treatment device comprising: a treatment bath configured to store a treatment liquid in which a treatment object is to be immersed; a transport section configured to transport the treatment object; and a temperature control section provided in at least one of the treatment bath and a position spaced from the treatment bath and configured to perform at least one of heating and cooling of the treatment object, the treatment object being at least one of: a laminated substrate including a device substrate, a support substrate, and an adhesive provided between the device substrate and the support substrate,the device substrate with the adhesive attached thereto, andthe support substrate with the adhesive attached thereto.
地址 Yokohama-shi, Kanagawa-ken JP