发明名称 FILM-FORMING COMPOSITION AND FILM-FORMING METHOD USING SAME
摘要 [Problem] To provide a film forming composition and a method for preparing a film with which it is possible to form a film having excellent gas barrier performance.;[Means for Solution] Disclosed is a film forming composition comprising: a polysiloxane that does not include a hydroxyl group or a carboxyl group; a polysilazane; and an organic solvent. Also disclosed is a method for preparing a film comprising: coating a substrate with said composition; and exposing the same to light.
申请公布号 US2016244638(A1) 申请公布日期 2016.08.25
申请号 US201414913821 申请日期 2014.09.16
申请人 AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. 发明人 OZAKI Yuki;SATAKE Noboru;KAWATO Shunji;KOBAYASHI Masakazu
分类号 C09D183/14;B05D3/06;B05D3/04;B05D7/04 主分类号 C09D183/14
代理机构 代理人
主权项 1. A film forming composition comprising: a polysiloxane represented by the following general formula (1): wherein,R11 is a group each independently selected from the group consisting of a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an alkoxy group, an amino group, and an alkylsilyl group, and may be substituted by one or more of groups selected from the group consisting of a halogen atom, an alkyl group, an alkoxy group, an amino group, a silyl group and an alkylsilyl group when R11 is a group other than a hydrogen atom;the total number of amino groups and alkoxy groups contained in all of R11 in the formula is not more than 5% of the total number of R11; andR12 is each independently a hydrocarbon group having 1 to 8 carbon atoms or —R13—N—R142, wherein R13 is a hydrocarbon group having 1 to 5 carbon atoms, and R14 is each independently hydrogen or a hydrocarbon group having 1 to 3 carbon atoms, a polysilazane and an organic solvent.
地址 Luxembourg LU