发明名称 ガスクラスター照射機構およびそれを用いた基板処理装置、ならびにガスクラスター照射方法
摘要 A gas cluster irradiation mechanism includes at least one nozzle unit having a plurality of gas injection nozzles, and a gas supply unit for supplying the gas to the nozzle unit. The plurality of the gas injection nozzles is set such that when the gas is supplied from the gas injection nozzles at a preset flow rate a pressure in the processing chamber remains below a limit at which the gas cluster begins to be destroyed. Further, the gas injection nozzles are arranged with a preset interval between neighboring gas injection nozzle such that respective areas in which residual gas from the neighboring gas injection nozzles spreads do not overlap with each other, the residual gas being part of the gas injected from the gas injection nozzles and not contributing to generation of the gas cluster.
申请公布号 JP5945178(B2) 申请公布日期 2016.07.05
申请号 JP20120150695 申请日期 2012.07.04
申请人 東京エレクトロン株式会社 发明人 井内 健介;土橋 和也
分类号 H01L21/304;B08B5/00;H01L21/302;H01L21/3065 主分类号 H01L21/304
代理机构 代理人
主权项
地址