| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing composition and a polishing method for more proper polishing of a nickel phosphorous-plated disc substrate. <P>SOLUTION: The polishing method includes a step of polishing an object to be polished by using, together with a suede type polishing pad, the polishing composition containing: a pad degrading inhibitor selected from a diethylenetriamine penta-acetic acid, a hydroxy ethyl ethylenediamine triacetic acid, a triethylenetetramine hexa-acetic acid and a glutamic acid diacetic acid, and their alkali metal salts and ammonium salts; and an oxidizer. <P>COPYRIGHT: (C)2012,JPO&INPIT |
