发明名称 |
SEMICONDUCTOR MEMORY DEVICE, AND MANUFACTURING METHOD THEREOF |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor memory device that increases the coupling capacity in which a control gate is coupled with a floating gate even when a memory cell is microfabricated. Ž<P>SOLUTION: The semiconductor memory device may include a tunneling dielectric film 103 provided on a semiconductor substrate; floating gates FG1 and FG2 formed on the tunneling dielectric film and according to memory cells; a gate dielectric film 104 provided on the floating gate; and a control gate CG provided on the gate dielectric film, wherein the floating gate provided according to a single memory cell has a first gate part FG1 and a second gate part FG2, and the floating gate has a part in which the tunneling dielectric film and the gate dielectric film contact between the first gate part and the second gate part within the memory cell. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010021461(A) |
申请公布日期 |
2010.01.28 |
申请号 |
JP20080182475 |
申请日期 |
2008.07.14 |
申请人 |
TOSHIBA CORP |
发明人 |
AOKI NOBUTOSHI;KONDO MASAKI |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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