| 摘要 |
A cylindrical structure (1200) for use in an RF sputter process, comprising a backing tube (1203,1205) comprising or consisting of a layer of an electrically insulating material (1205) and at least one electrode (1204) arranged at least partly within or at least partly on top of said electrically insulating material, said electrode being adapted for receiving RF power from an RF power source, wherein the at least one electrode (1204) has such a distributed shape and size that a substantially uniform electrical field for sputtering is created, when used in a sputter system. A magnetron comprising said cylindrical structure (1200), and a sputter system comprising said magnetron are also provided. |
