| 发明名称 |
MOUNTING TABLE AND SUBSTRATE PROCESSING APPARATUS |
| 摘要 |
Provided is a mounting table according to one aspect of the present disclosure includes: a ceramic body; a heater provided in the ceramic body; a base including a support surface that supports the ceramic body and provides a space for accommodating a temperature sensor as a space that is opened at least at the support surface side; and a heat transfer body extending between a first end provided in the ceramic body and a second end that is positioned above the space and provided closer to the space than the first end, the heat transfer body having a heat conductivity that is higher than that of the ceramic body around the heat transfer body. |
| 申请公布号 |
US2016198528(A1) |
申请公布日期 |
2016.07.07 |
| 申请号 |
US201514977001 |
申请日期 |
2015.12.21 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KITAGAWA Dai |
| 分类号 |
H05B3/28;H01J37/32;H05B3/06;H05B3/00;H05B3/02 |
主分类号 |
H05B3/28 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A mounting table comprising:
a ceramic body; a heater provided in the ceramic body; a base including a support surface that supports the ceramic body and provides a space for accommodating a temperature sensor as a space that is opened at least at the support surface side; and a heat transfer body extending between a first end provided in the ceramic body and a second end that is positioned above the space and provided closer to the space side than the first end, the heat transfer body having a heat conductivity that is higher than that of the ceramic body around the heat transfer body. |
| 地址 |
Tokyo JP |
