发明名称 METAL MULTI-LAYERED FILM STRUCTURE AND FILM DEPOSITION METHOD THEREFOR
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of depositing on a resin substrate a multi-layered film excellent in durability at a lower material expense under safe working environments in a short period of time with an excellent yield. <P>SOLUTION: A resin substrate 6 to be film-deposited is mounted on a freely rotatably supported substrate holder 5. Metal targets 4 of different kinds are mounted on each of a plurality of cathodes 3 fixed so as to surround the resin substrate 6. Each metal target 4 is sputtered in an inert gas atmosphere, and the resin substrate 6 mounted on the rotating substrate holder 5 is film-deposited successively and alternately to form a metal multi-layered film. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008045168(A) 申请公布日期 2008.02.28
申请号 JP20060221058 申请日期 2006.08.14
申请人 STANLEY ELECTRIC CO LTD 发明人 SUZUKI YOSHIO;SUZUKI AKIRA
分类号 C23C14/14;B32B15/08 主分类号 C23C14/14
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