发明名称 |
ARTICLE WITH PHEMA LIFT-OFF LAYER AND METHOD THEREFOR |
摘要 |
A method of forming a patterned functional layer on a substrate using a poly(hydroxyethyl methacrylate) lift-off layer is described. The method can be used with substrates that would not tolerate the organic solvents required for processing of known poly(methyl methacrylate) lift-off layers. When used in combination with known nanoimprint lithography and step-and-flash imprint lithography techniques, the method can be used to generate patterned functional structures with dimensions as small as five nanometers.
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申请公布号 |
US2009011141(A1) |
申请公布日期 |
2009.01.08 |
申请号 |
US20080062058 |
申请日期 |
2008.04.03 |
申请人 |
CARTER KENNETH RAYMOND;JHAVERI SARAV BHARAT |
发明人 |
CARTER KENNETH RAYMOND;JHAVERI SARAV BHARAT |
分类号 |
B05D3/06;B05D5/00 |
主分类号 |
B05D3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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