LITHOGRAPHIC METHOD, LITHOGRAPHIC APPARATUS, AND MANUFACTURING METHOD OF ARTICLE

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus technique which has advantageous in an overlay accuracy.SOLUTION: An adjusting method of a lithographic apparatus includes: a first step S51 for adjusting telecentricity of a detection optical system that detects a mark on a substrate regardless to a moving amount of a stage in a direction of an optical axis of the detection optical system; a second step S52 for adjusting a parallelism of a driving axis of the stage to the optical axis on the basis of the moving amount of a stage in the direction of an optical axis and the detection by the detection unit after the first step; and a third step S53 for adjusting perpendicularity between a beam projected from the projection optical system and a surface of the substrate on the basis of the moving amount of a stage in the direction of an optical axis after the second step.SELECTED DRAWING: Figure 3