Reducing MEMS stiction by deposition of nanoclusters

摘要

Certain microelectromechanical systems (MEMS) devices, and methods of creating them, are disclosed. The method may include forming a structural layer over a substrate; forming a mask layer over the structural layer, wherein the mask layer is formed with a material selective to an etching process; forming a plurality of nanoclusters on the mask layer; and etching the structural layer using at least the etching process.

主权项

1. A method for manufacturing a microelectromechanical systems (MEMS) device, the method comprising:
forming a structural layer over a substrate; forming a mask layer over the structural layer, wherein the mask layer is formed with a material selective to an etching process; forming a plurality of nanoclusters on the mask layer; using the nanoclusters as a mask for removing portions of the mask layer; and etching the structural layer using remaining portions of the mask layer as a mask for the etching of the structural layer forming a plurality of surface roughness features on a travel stop of the MEMS device.