发明名称 |
Transparent thin film electrode for light emitting diode and laser diode |
摘要 |
Provided is a transparent thin film electrode for forming an ohmic contact to a p-type semiconductor containing nitrogen (N) and gallium (Ga) in order to realize a high quality light emitting diode (LED) and a laser diode (LD). T he transparent thin film electrode includes a copper (Cu)-based conductive layer including Cu and another metal and a metal capping layer formed on the copper-based conductive layer. Alternatively, the transparent thin film electrode may include a Cu-based conductive layer, an intermediate layer formed on the Cu-based conductive layer, and a metal capping layer formed on the intermediate layer.
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申请公布号 |
US2005040755(A1) |
申请公布日期 |
2005.02.24 |
申请号 |
US20040923036 |
申请日期 |
2004.08.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SONG JUNE-O;LEEM DONG-SEOK;SEONG TAE-YEON |
分类号 |
H01J1/62;H01L33/32;H01L33/42;(IPC1-7):H01J1/62 |
主分类号 |
H01J1/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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