发明名称 Transparent thin film electrode for light emitting diode and laser diode
摘要 Provided is a transparent thin film electrode for forming an ohmic contact to a p-type semiconductor containing nitrogen (N) and gallium (Ga) in order to realize a high quality light emitting diode (LED) and a laser diode (LD). T he transparent thin film electrode includes a copper (Cu)-based conductive layer including Cu and another metal and a metal capping layer formed on the copper-based conductive layer. Alternatively, the transparent thin film electrode may include a Cu-based conductive layer, an intermediate layer formed on the Cu-based conductive layer, and a metal capping layer formed on the intermediate layer.
申请公布号 US2005040755(A1) 申请公布日期 2005.02.24
申请号 US20040923036 申请日期 2004.08.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SONG JUNE-O;LEEM DONG-SEOK;SEONG TAE-YEON
分类号 H01J1/62;H01L33/32;H01L33/42;(IPC1-7):H01J1/62 主分类号 H01J1/62
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