发明名称 ANTISTATIC SILICONE RELEASE COATING FILMS
摘要 <p>The invention relates to an antistatic silicone release film having a layer coated with an antistatic silicone release composition, and, used for semiconductors, electronics and display devices while addressing problems of static electricity generated when a general release film is separated from adhesive or an adhesive layer, and of contamination by such static electricity that causes critical product defects. The invention also relates to an antistatic silicon release film that can reduce product contamination caused by static electricity in peeling the film from adhesive or an adhesive layer, and achieves close adhesion between a substrate and a coated layer because of no interruption in curing a release layer, and also thereby has a stable release property.</p>
申请公布号 WO2008114916(A1) 申请公布日期 2008.09.25
申请号 WO2007KR04288 申请日期 2007.09.05
申请人 TORAY SAEHAN INC.;YOON, JONG-UK;LEE, JEONG-WOO;LEE, MOON-BOK;SUH, KI-BONG;KIM, SANG-PIL 发明人 YOON, JONG-UK;LEE, JEONG-WOO;LEE, MOON-BOK;SUH, KI-BONG;KIM, SANG-PIL
分类号 B32B27/16 主分类号 B32B27/16
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