THREE-DIMENSIONAL THIN-FILM NITINOL DEVICES

摘要

A method of manufacturing three-dimensional thin-film nitinol (NiTi) devices includes: depositing multiple layers of nitinol and sacrificial material on a substrate. A three-dimensional thin-film nitinol device may include a first layer of nitinol and a second layer of nitinol bonded to the first layer at an area masked and not covered by the sacrificial material during deposition of the second layer.

主权项

1. A method comprising:
deep reactive ion etching a pattern of grooves on a surface of a semiconductor substrate, the grooves corresponding to fenestrations in a desired three-dimensional nitinol structure; depositing a lift-off layer on the grooved semiconductor substrate surface; depositing a first NiTi layer over the lift-off layer; depositing a sacrificial layer to partially cover the first NiTi layer, the sacrificial layer corresponding to a lumen in the desired three-dimensional nitinol structure; and depositing a second NiTi layer over the sacrificial layer.