| 发明名称 |
APPARATUS FOR PROCESSING SUSTRATE AND SEMICONDUCTOR FABRICATION LINE INCLUDING THE SAME |
| 摘要 |
In a substrate processing apparatus and a fabrication line including the same, the substrate processing apparatus includes a first unit apparatus performing a first unit process of a substrate, a second unit apparatus facing the first unit apparatus and performing a second unit process, and a load port providing a carrier receiving the substrate to the first unit apparatus and the second unit apparatus. The load port connects between the first unit apparatus and the second unit apparatus. |
| 申请公布号 |
US2016293459(A1) |
申请公布日期 |
2016.10.06 |
| 申请号 |
US201615082474 |
申请日期 |
2016.03.28 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Cha Sangyeob;Park Yongduk;Jang Young-Chun |
| 分类号 |
H01L21/67 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus for processing a substrate, the apparatus comprising:
a first unit apparatus performing a first unit process for the substrate; a second unit apparatus facing the first unit apparatus, the second unit apparatus performing a second unit process for the substrate; and a load port providing a carrier receiving the substrate to the first unit apparatus and the second unit apparatus, the load port connecting between the first unit apparatus and the second unit apparatus and between the first unit apparatus and the second unit process. |
| 地址 |
Suwon-si KR |
