发明名称 Scatterometry to simultaneously measure critical dimensions and film properties
摘要 An ellipsometer includes a light source for generating a probe beam of polychromatic light for interacting with a sample. A polarizer is used to impart a known polarization state to the probe beam and the polarized probe beam is directed against the sample at a shallow angle of incidence. A rotating compensator is used to impart phase retardations to the polarization state of the reflected probe beam. After passing through the compensator, the probe beam passes through a second polarizer (analyzer). After leaving the analyzer, the probe beam is received by a detector. The detector translates the received probe beam into a signal that includes DC, 2omega and 4omega signal components (where omega is the angular velocity of the rotating compensator). A processor analyzes the signal using the DC, 2omega and 4omega components allowing simultaneous evaluation of both critical dimensions and film parameters.
申请公布号 US2005041250(A1) 申请公布日期 2005.02.24
申请号 US20020319189 申请日期 2002.12.13
申请人 OPSAL JON 发明人 OPSAL JON
分类号 G01B11/06;G01N21/21;G01N21/84;(IPC1-7):G01J4/00 主分类号 G01B11/06
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