| 摘要 |
A contact lithography system includes a patterning tool for transferring a pattern to a substrate; and a capacitive alignment system disposed on the patterning tool for cooperating with a corresponding alignment system disposed on the substrate for determining relative alignment of the patterning tool and substrate. A method of aligning a patterning tool and a substrate in a contact lithography system includes determining, based on a signal transferred through capacitors formed by opposing conductive elements disposed respectively on the patterning tool and substrate, alignment of the patterning tool and substrate.
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