| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface treatment agent and a pattern forming method using the surface treatment agent for a freezing process for performing chemical treatment to a first resist pattern to satisfy requirements that the first resist pattern does not dissolve into a second resist solution, the dimensions of the first resist pattern do not change and furthermore the dry etching resistance of the first resist pattern and that of the second resist pattern are the same in the freezing process wherein chemical treatment is performed to the first resist pattern to change properties so that the first resist pattern does not dissolve into the second resist solution in order to form a second resist film on the first resist pattern to form the second resist pattern after forming the first resist pattern on a first resist film. <P>SOLUTION: The surface treatment agent for forming the pattern contains a specific compound having an amino group and an aromatic ring, and the pattern forming method uses the surface treatment agent. <P>COPYRIGHT: (C)2009,JPO&INPIT |
