发明名称 EXPOSURE DEVICE, LIQUID IMMERSION SYSTEM, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device capable of suppressing occurrence of an exposure defect. <P>SOLUTION: The exposure device exposes a substrate to exposure light through first liquid. The exposure device has a first supply hole for supplying the first liquid, a liquid immersion member which has a first surface disposed at least partially in a circumference of the optical path of the exposure light and can hold the first liquid supplied from the first supply hole between a body which is movable to the first surface and the first surface, and a drying preventing device which prevents the first surface from being dried. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009021498(A) 申请公布日期 2009.01.29
申请号 JP20070184463 申请日期 2007.07.13
申请人 NIKON CORP 发明人 NAGASAKA HIROYUKI
分类号 H01L21/027 主分类号 H01L21/027
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