发明名称 FILM FORMING MASK AND MASK ADHESION METHOD
摘要 <p>Provided is a film forming mask which is excellently adhered on a substrate, makes it possible to form a film having excellent pattern accuracy and has extremely high practicality. A mask adhesion method is also provided. The film forming mask is provided with a mask main body (1) having an opened pattern which permits a film forming material to pass through, and a holding frame (2) for holding the mask main body (1). In the film forming mask, a substrate (6) to which the film forming material is to be adhered through the opened pattern is laminated. The holding frame (2) is provided with a pair of holding sections (4), which are respectively arranged along a pair of sides (3) out of the four sides of the mask main body (1) and hold the pair of sides (3), and the mask main body (1) is held only by the pair of holding sections (4). The mask main body (1) warps by the weight of itself between the pair of sides (3) held by the pair of holding sections (4), and the pair of sides (3) are fixed to the pair of holding sections (4) so that the quantity of warp changes in the facing direction of the pair of sides (3).</p>
申请公布号 WO2009075163(A1) 申请公布日期 2009.06.18
申请号 WO2008JP70815 申请日期 2008.11.14
申请人 TOKKI CORPORATION;KYUSHU HITACHI MAXELL, LTD.;KONDO, YOSHINARI;SUZUKI, KENTARO;MATSUMOTO, EICHI;KOBAYASHI, YOSHIHIRO;ISHIKAWA, KIICHIRO 发明人 KONDO, YOSHINARI;SUZUKI, KENTARO;MATSUMOTO, EICHI;KOBAYASHI, YOSHIHIRO;ISHIKAWA, KIICHIRO
分类号 C23C14/04 主分类号 C23C14/04
代理机构 代理人
主权项
地址