| 摘要 |
PURPOSE: Number of masks of liquid-crystal display is closely related to the production cost of the active panel and the old process with more than eight masks has changed to six masks, five masks, and four masks. But in the four masks process, a part of the gate wire is exposed during the second mask process and is connected to ITO(Indium Tin Oxide) consisting the pixel electrode in the third mask process, which causes the point defect or the gate wire to be eroded by the etching material during ITO pattern. This four mask manufacturing process is provided to solve the above problems. CONSTITUTION: In the first step, the stage where the gate electrode(111), the gate wire(113), and the gate pad(115) on both sides of the gate wire(113) are formed on the board(101) with the first electric conductor by using the first mask.; In the second step, the gate insulation film(117), pure semiconductor like amorphous silicon(113b), impurities semiconductor(135b), and the source-drain substance(129) are attached in succession and they are patterned using the second mask for the board and the gate pad of the pixel electrode to be exposed.; In the third step, pixel electrode substance is attached on the source-drain substance(129) and the board(101) and the pixel electrode(131), the gate pad terminal(151), the source pad terminal(161), the source wire(123), the source electrode(123), and the drain electrode(131), and the sub capacity electrode(127) are formed using the third mask.; In the forth step, the protection film(137) substance is attached on the pixel electrode(141) and the pixel electrode(141), the gate pad(115), the source pad(161), and the semiconductor substance which covers the part not overlapped with the source wire(123) are exposed and inscribed, and the exposed semiconductor layer is removed.
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