发明名称 BARIUM SILICIDE POLYCRYSTAL, METHOD FOR PRODUCING THE SAME, AND BARIUM SILICIDE SPUTTERING TARGET
摘要 <P>PROBLEM TO BE SOLVED: To provide a barium silicide polycrystal having a low oxygen content, which has high density and no crack, and to provide a barium silicide sputtering target having a low oxygen content. <P>SOLUTION: The barium silicide polycrystal, characterized in that the oxygen content in the polycrystal is 10 mol% or less and the density is 3.0 g/cm<SP POS="POST">3</SP>or more, is produced by preparing a barium silicide powder having an oxygen content of 10 mol% or less by using barium and silicon powders. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012214828(A) 申请公布日期 2012.11.08
申请号 JP20110079547 申请日期 2011.03.31
申请人 TOSOH CORP 发明人 MESHIDA MASAMI;MATSUMARU KEITARO
分类号 C23C14/34 主分类号 C23C14/34
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