发明名称 |
POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
摘要 |
A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0). [wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 0 or 1; and R1 represents an acid dissociable, dissolution inhibiting group.]
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申请公布号 |
US2009061356(A1) |
申请公布日期 |
2009.03.05 |
申请号 |
US20080198557 |
申请日期 |
2008.08.26 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
DAZAI TAKAHIRO;MORI TAKAYOSHI;SHIMIZU HIROAKI;OHSHITA KYOKO;HIRAHARA KOMEI |
分类号 |
G03C1/053;C08F20/10;C08F224/00;G03F7/20 |
主分类号 |
G03C1/053 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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