| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition superior in resolution in formation of a minute pattern and superior in pattern controllability in a thermal flow process, and to provide a pattern forming method using it. <P>SOLUTION: The positive photosensitive composition contains (A) a compound generating acid by irradiation of active light or radiation, and (B) a resin having a repeating unit lowered by a molecular weight due to heat and increasing solubility to an alkali developer due to action of acid. The pattern forming method using it is provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
