| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with little pattern collapse can be produced. <P>SOLUTION: The resist composition includes: (A) a resin which is insoluble or poorly soluble with an alkali aqueous solution and which can dissolve in an alkali aqueous solution by the action of an acid; (B) an acid generator expressed by formula (II); and (D) a compound expressed by formula (I). In the formulae, R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>each independently represent a hydrocarbon group, an alkoxy group or the like; m and n each independently represent an integer of 0 to 4; R<SP POS="POST">3</SP>and R<SP POS="POST">4</SP>each independently represent a fluorine atom or a perfluroalkyl group; X<SP POS="POST">1</SP>represents a divalent saturated hydrocarbon group; R<SP POS="POST">5</SP>represents a group including a cyclic ether structure; and Z1<SP POS="POST">+</SP>represents an organic cation. <P>COPYRIGHT: (C)2013,JPO&INPIT |
