| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method capable of preventing cut-out chips from being generated and defocusing from being caused. <P>SOLUTION: A shot-region allocation that projects a mask region, where a proper number of pieces of display patterns, is arranged is performed to execute exposure by shielding the light to other than regions to be projected. A mask where a plurality of peripheral regions 102 to 109 are separated and arranged with a shielding belt outside a central region 101, where a plurality of each of vertical and horizontal device patterns 2 are arranged is used to perform a shot region allocation that projects a proper region to each of a central section and the periphery of the wafer, to perform exposure. <P>COPYRIGHT: (C)2009,JPO&INPIT |
