COMPOSITION FOR ORGANIC PATTERN EMBEDDING, PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

摘要

This composition for organic pattern embedding contains a resin that has an Ohnishi parameter of more than 5.0. This pattern forming method and this method for manufacturing an electronic device comprise, in the following order: a step for forming a first resist film; a step for exposing the first resist film to light; a step for forming a first pattern; a step for forming a planarization layer; a step for forming a second resist film; a step for exposing the second resist film to light; and a step for forming a second pattern.