| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition from which a high-definition spacer having high hardness, excellent elastic recovery property, high resolution and high adhesiveness can be formed.SOLUTION: The photosensitive resin composition comprises, as essential components, a hydrophilic resin (A) having a radically polymerizable organic group, a polyfunctional (meth)acrylate (B), an inorganic filler (C) having a radically polymerizable organic group, a radical trapping agent (D), and a photopolymerization initiator (E). A photospacer is produced by curing the above photosensitive resin composition.SELECTED DRAWING: None |
