POWER SUPPLY FOR SEMICONDUCTOR PLASMA ETCHING CHAMBER

摘要

PURPOSE: A power supply is provided to preform etching processing smoothly by preventing a impurity or arc from being generated by rotating a rotating electrode. CONSTITUTION: The power supply comprises a rotating electrode(48), a bracket(40) and a linking member(34). The rotating electrode is connected with a cathode electrode, rotates the cathode electrode by a rotatory motion and transmits the power to the cathode electrode. A through hole for accommodating the rotating electrode is formed on the center of the bracket. A plurality of bearings(46) is fixed between the inside wall of the through hole and the rotating electrode so as to perform a twist-free movement by rotatory motion of the rotating electrode. The linking member connects the bracket to power supply source. Thereby, it is possible to prevent a impurity or arc from being generated so that it can smoothly execute etching process.