| 摘要 |
PROBLEM TO BE SOLVED: To improve particle performance of a substrate processing device.SOLUTION: A substrate processing device (1) includes a liquid processing tank for processing a substrate (2), a dry processing tank (4) for drying the substrate (2) undergoing the liquid processing, a dry gas supply nozzle (27) provided inside the dry processing tank (4) to supply dry gas for drying the substrate (2), a substrate conveyance body (52) for making the substrate (2) subjected to the liquid processing in the liquid processing tank pass through over the dry gas supply nozzle (27) to convey the substrate to the dry processing tank (4), and processing liquid infiltration prevention means for preventing the processing liquid falling down from the substrate (2) from infiltrating into a discharge port (30) of the dry gas supply nozzle (27) when the substrate conveyance body (52) makes the substrate (2) pass through over the dry gas supply nozzle (27).SELECTED DRAWING: Figure 4 |
