SEQUENTIAL ICP OPTICAL EMISSION SPECTROMETER AND METHOD FOR CORRECTING MEASUREMENT WAVELENGTH

摘要

A sequential inductively coupled plasma (ICP) optical emission spectrometer includes a controller that operates to perform a series of process based on a shift amount (time dependency) of a wavelength peak position according to time elapse of a reference wavelength obtained as a result of continuously measuring a plurality of emission lines of argon having different wavelengths as the reference wavelength and a per-wavelength shift amount (wavelength dependency) of the reference wavelength, the process including: calculating a shift amount of a wavelength peak position of each measurement wavelength from a standard sample measurement time to an unknown sample measurement time; and performing measurement wavelength correction for correcting the movement position of the diffracting grating corresponding to the wavelength peak position of the measurement wavelength relative to the initial position.

主权项

1. A sequential inductively coupled plasma (ICP) optical emission spectrometer comprising:
an inductively coupled plasma generator that is configured to atomize or excite an element by inductively coupled plasma and to obtain an emission line of the element; a spectroscope configured to receive the emission line and spectrally dispersing and detecting the emission line using a diffracting grating; a detector configured to detect the emission line that is spectrally dispersed by the spectroscope; and a controller configured to analyze an element to be measured based on a wavelength peak position of the emission line detected in the detector, wherein the controller operates to perform a series of process based on a shift amount (time dependency) of a wavelength peak position according to time elapse of a reference wavelength obtained as a result of continuously measuring a plurality of emission lines of argon having different wavelengths as the reference wavelength and a shift amount (wavelength dependency) of the reference wavelength for each wavelength of each element, the process comprising: calculating a shift amount of a wavelength peak position of each measurement wavelength from a standard sample measurement time to an unknown sample measurement time; and performing measurement wavelength correction for correcting the movement position of the diffracting grating corresponding to the wavelength peak position of the measurement wavelength relative to the standard sample measurement time.