| 摘要 |
This method for producing a polishing liquid composition comprises a step for filtering a silica dispersion liquid to be processed, which contains colloidal silica, with use of a filter containing a filtration assistant. The colloidal silica has an average particle diameter of primary particles of from 1 nm to 50 nm (inclusive) as determined by a titration method, and the filtration assistant has a hydroxyl group density of 0.40 × 10-5 mol/m2 or more. It is preferable that the ratio of the average particle diameter of primary particles of the colloidal silica as determined by a titration method to the average particle diameter of the filtration assistant as determined by a laser particle size distribution measuring instrument is from 1.20 × 10-3 to 4.20 × 10-3 (inclusive). |
