| 发明名称 |
Positive type photoresist composition |
| 摘要 |
To provide a positive type photoresist composition which is capable of forming a resist pattern having an excellent adhesion to a substrate, a positive type photoresist composition comprising a polymer containing a specified amount of a polypropylene oxide group and a polyethylene oxide group is provided.
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| 申请公布号 |
US6156474(A) |
申请公布日期 |
2000.12.05 |
| 申请号 |
US19980203986 |
申请日期 |
1998.12.02 |
| 申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
NAKANO, SIGEKI;AWAJI, AKIRA;OGAWA, TERUAKI;TAKAHASHI, KENTA |
| 分类号 |
G03F7/085;G03F7/022;H01L21/027;(IPC1-7):G03F7/023 |
主分类号 |
G03F7/085 |
| 代理机构 |
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