| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for efficiently manufacturing a halftone phase shift mask blank having less minute defects, with a high yield. SOLUTION: In the method for manufacturing a halftone phase shift mask blank, including steps of (S5) forming a halftone material film containing silicon on a transparent substrate and of (S8) forming a light-shielding film on the halftone material film to produce a halftone phase shift mask blank, a step (S6) of physically cleaning the surface of the halftone material film, by using physical energy as the cleaning power is carried out after the step (S5) of forming the halftone material film and before the step (S8) of forming the light-shielding film. The physical cleaning is carried out, by at least one of scrub cleanings by bringing a rotating cleaning tool into contact with the surface, dual-flow spray cleaning by spraying a cleaning liquid comprising a mixture of gas and a solvent, and by ultrasonic cleaning by supplying a cleaning liquid with addition of ultrasonic waves. COPYRIGHT: (C)2005,JPO&NCIPI |
