| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that can be used to the microfabrication of a semiconductor. <P>SOLUTION: A compound is represented by formula (I). In the formula (I), T<SP POS="POST">1</SP>represents a single bond or an aromatic hydrocarbon group, L<SP POS="POST">1</SP>represents a C1-C17 divalent saturated hydrocarbon group, m represents 0 or 1, L<SP POS="POST">2</SP>and L<SP POS="POST">3</SP>represent a single bond or a C1-C6 divalent saturated hydrocarbon group, ring W<SP POS="POST">1</SP>and ring W<SP POS="POST">2</SP>represent a C3-C36 hydrocarbon ring, R<SB POS="POST">1</SB>and R<SP POS="POST">2</SP>represent a hydrogen atom or the like, R<SP POS="POST">3</SP>and R<SP POS="POST">4</SP>represent a hydroxyl group or the like, R<SP POS="POST">5</SP>represents a hydroxyl group or a methyl group, t represents an integer of 0 to 2, and u represents an integer of 0 to 2. <P>COPYRIGHT: (C)2013,JPO&INPIT |
