发明名称 MANUFACTURING METHOD OF SILICON CARBIDE SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a silicon carbide substrate capable of obtaining a silicon carbide crystal having little dislocation by suppressing increase of dislocation on a seed substrate main surface.SOLUTION: A manufacturing method of a silicon carbide substrate has following steps. A part of a silicon carbide raw material 8 is sublimed. After the part of the silicon carbide raw material 8 is sublimed, a seed substrate 1 having a main surface 1A is arranged in a growth vessel 10. A silicon carbide crystal 11 is grown on the main surface 1A of the seed substrate 1 by subliming the residue of the silicon carbide raw material 8 in the growth vessel 10.SELECTED DRAWING: Figure 1
申请公布号 JP2016106070(A) 申请公布日期 2016.06.16
申请号 JP20160055586 申请日期 2016.03.18
申请人 SUMITOMO ELECTRIC IND LTD 发明人 FUJIWARA SHINSUKE;NISHIGUCHI TARO;HORI TSUTOMU;OI NAOKI;UETA SHUNSAKU
分类号 C30B29/36 主分类号 C30B29/36
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