| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint device having advantageous in overlapping with a pattern present on a substrate in advance and a resin pattern newly formed on the substrate when imprint processing is performed.SOLUTION: An imprint device 1 for forming a pattern of an imprint material on a substrate side pattern region of a substrate 10 using a mold includes: a heating mechanism 6 that irradiates the substrate 10 with light having a second wavelength different from light having a first wavelength for curing the imprint material, and heats the substrate side pattern region; and a control section 7 for controlling the heating mechanism 6. A nonuniform temperature distribution is made to be formed in the substrate side pattern region with irradiation of the light having the second wavelength having an illuminance distribution with the use of the heating mechanism 6 and the control section 7, and the substrate side pattern region is made to approximate a target shape.SELECTED DRAWING: Figure 2 |
