| 发明名称 |
PHOTOBASE GENERATORS AND PHOTORESIST COMPOSITIONS COMPRISING SAME |
| 摘要 |
New photobase generators suitable for use in photoresists are provided that correspond to Formula (I):;X1—R1—O—C(═O)N(R2)R3 (I);wherein X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms. |
| 申请公布号 |
US2016334703(A1) |
申请公布日期 |
2016.11.17 |
| 申请号 |
US201615153310 |
申请日期 |
2016.05.12 |
| 申请人 |
Rohm and Haas Electronic Materials Korea Ltd. |
发明人 |
Jang Min-Kyung;Ryu Eui-Hyun;Hong Chang-Young;Kim Myung Yeol;Lee Jung-June;Hong Dong-Je;Kim Dong-Yong;Lim Hae-Jin;Ahn Jae Yun;Jeon Ohk-Min |
| 分类号 |
G03F7/004;C07C271/14;G03F7/32;C07C271/12;G03F7/038;G03F7/20 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photobase generator that corresponds to the following Formula (I):
X1—R1—O—C(═O)N(R2)R3 (I) wherein:: X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms. |
| 地址 |
Cheonan KR |
