发明名称 METHOD AND DEVICE FOR TESTING DEFECT USING SEM
摘要 In performing a programmed-point inspection of a circuit pattern using a review SEM, stable inspection can be performed while suppressing the generation of a false report even when a variation in a circuit pattern to be inspected is large. SEM images that are obtained by sequentially imaging a predetermined circuit pattern using the review SEM are stored into a storage unit. Images that meet a set condition are selected from the stored SEM images, and averaged to create an average image (GP image). By performing pattern check by GP comparison using this GP image, an inspection can be performed while suppressing the generation of a false report even when a variation in the circuit patterns is large.
申请公布号 KR20130007542(A) 申请公布日期 2013.01.18
申请号 KR20127017383 申请日期 2010.12.22
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 TAKAGI YUJI;HARADA MINORU;NAKAGAKI RYO;HOSOYA NAOKI;HONDA TOSHIFUMI;HIRAI TAKEHIRO
分类号 G01N23/225;H01L21/027;H01L21/66 主分类号 G01N23/225
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