| 发明名称 |
Apparatus and method for slurry cleaning of etch chambers |
| 摘要 |
<p>Described are methods of cleaning debris from semiconductor etch chambers or chamber components, one method comprising directing atomized abrasive slurry onto at least some internal surfaces of such a chamber or chamber components. Apparatus for carrying out the methods are also described.
</p> |
| 申请公布号 |
EP1785230(A3) |
申请公布日期 |
2007.07.18 |
| 申请号 |
EP20060255599 |
申请日期 |
2006.10.31 |
| 申请人 |
THE BOC GROUP, INC. |
发明人 |
DAVIS, IAN MARTIN;LAUBE, DAVID PAUL |
| 分类号 |
B24C3/32;B24C5/04;B24C7/00;C23C14/56;H01L21/00 |
主分类号 |
B24C3/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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