| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a process liquid supply apparatus which efficiently removes bubbles accumulated in a filter without disposing the process liquid, and to provide a substrate processing apparatus, a removal method of bubbles, and a substrate processing method. <P>SOLUTION: A process liquid from which bubbles are removed by a filter 250 is supplied to a nozzle 28 through pipelines L9, L11 when a substrate is processed. At the time of the removal of the bubbles, a valve v5 is opened and a valve v2 is closed and these operations allow the process liquid containing the bubbles to be returned from the filter 250 to a vapor liquid separation trap tank 230 through a pipeline L8. When a certain amount of a gas is accumulated in an upper space in the vapor liquid separation trap tank 230 to thereby lower a liquid surface of the process liquid in the vapor liquid separation trap tank 230 to a preset given position, the valve v5 is closed and the valve v2 is opened. <P>COPYRIGHT: (C)2013,JPO&INPIT |
