| 摘要 |
PROBLEM TO BE SOLVED: To provide a novel photoresist composition comprising an improved photoactive component.SOLUTION: Provided is: a method for producing onium salt compound by treating an onium salt compound comprising a sulfonate component whose sulfonate component comprises electron-attracting group such as trifluoro-methane-sulfonyl or the like, and a cationic component represented by the following formula, with a halide salt, to form a different salt of onium compound; and a photoresist composition comprising polymer and said onium salt compound. (X is C=O, S(O), SO, C(=O)O, C(=O)NH, C(=O)-C(=O)-, or -O-; and R is optionally substituted carbocyclic aryl or optionally substituted alkyl.).SELECTED DRAWING: None |
