发明名称 METHOD FOR DESIGNING A MASK FOR AN INTEGRATED CIRCUIT HAVING SEPARATE TESTING OF DESIGN RULES FOR DIFFERENT REGIONS OF A MASK PLANE
摘要 The invention relates to a method for designing integrated circuits, especially to a description and testing of design rules, in which different design rules (6, 7) are intended to apply in one and the same process plane, for example in a metallization plane for producing conductor tracks in a high-volt smart power circuit, in which conductor tracks (12,13,14) with different potentials are provided. The method improves the process for checking faults, is economic and results in savings being made in terms of area on the semiconductor wafer.
申请公布号 KR20080036017(A) 申请公布日期 2008.04.24
申请号 KR20077030632 申请日期 2007.12.27
申请人 X-FAB SEMICONDUCTOR FOUNDRIES AG 发明人 LERNER RALF
分类号 G06F17/50 主分类号 G06F17/50
代理机构 代理人
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