| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target for magnetic recording medium film formation capable of suppressing generation of particles as well as forming a film with a low ordering temperature, and also provide a method of manufacturing the same. <P>SOLUTION: A sputtering target for magnetic recording medium film formation comprises a sintered body having a composition represented by the general formula:ä(Fe<SB POS="POST">x</SB>Pt<SB POS="POST">100-x</SB>)<SB POS="POST">(100-y)</SB>In<SB POS="POST">y</SB>}<SB POS="POST">(100-z)</SB>C<SB POS="POST">z</SB>, where 30≤x≤80, 1≤y≤20 and 3≤z≤65 with atom ratios. A method of manufacturing the sputtering target includes a step of hot pressing of a mixed powder of an InPt alloy powder, a FePt alloy powder, a Pt powder, and a graphite powder or carbon black powder, in a vacuum or inert gas atmosphere. <P>COPYRIGHT: (C)2013,JPO&INPIT |
