| 摘要 |
PCT No. PCT/JP98/04267 Sec. 371 Date May 24, 1999 Sec. 102(e) Date May 24, 1999 PCT Filed Sep. 21, 1998 PCT Pub. No. WO99/16773 PCT Pub. Date Apr. 8, 1999The present invention relates to novel compounds which contain no sulfur or chlorine, and which thus contribute to the cleaning of the environment as organo-metal complexes used in metal pastes, etc., and a method for manufacturing the same. Metal acetylide compounds expressed by the general formula M(-C 3BOND C-R)n (in the formula, M indicates a metal atom, n indicates the valence number of the metal atom M, and R indicates a hydrocarbon group with 1 to 8 carbon atoms which may or may not contain an oxygen atom) are provided as novel organo-metal complexes. Since these compounds contain no sulfur or chlorine, there is no release of sulfurous acid gas or chlorine compounds when the compounds are used in metal pastes, etc., even if the pastes are fired. Accordingly, these compounds contribute to the cleaning of the environment. In the present invention, solid sulfites are used as metal reducing agents; accordingly, simple stoichiometric control of the reaction is possible, so that metal acetylide compounds can easily be obtained. Furthermore, since no sulfurous acid gas is generated in this manufacturing method, there are no concerns about environmental pollution, and the method contributes to the cleaning of the environment.
|
