发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR
摘要 PURPOSE: To provide a semiconductor device for realizing low cost, along with its manufacturing method. CONSTITUTION: The semiconductor device includes a first electrode 32, a ferroelectric film 36 formed on the first electrode 32, and a second electrode 40 formed on the ferroelectric film 36. In this case, the semiconductor device includes middle layers 34 and 38 having a perovskite-based crystal structure and formed in at least one position between the first electrode 32 and the ferroelectric film 36 or between the ferroelectric film 36 and the second electrode 40.
申请公布号 KR20020060563(A) 申请公布日期 2002.07.18
申请号 KR20010062301 申请日期 2001.10.10
申请人 FUJITSU LIMITED 发明人 KURIHARA KAZUAKI;MARUYAMA KENJI
分类号 H01L27/105;H01L21/02;H01L21/8246;(IPC1-7):H01L27/105 主分类号 H01L27/105
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