发明名称 PHASE SHIFTING PHOTOLITHOGRAPHY SYSTEM
摘要 <p>A phase shifting photolithography system includes inserting a phase shift component in a path of an illumination, wherein the phase shift component modifies a portion of the illumination to a different, and controlling an aperture shutter of the phase shift component modifying an interference of the illumination and the illumination with the different phase.</p>
申请公布号 SG134265(A1) 申请公布日期 2007.08.29
申请号 SG20070002769 申请日期 2007.01.16
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LTD. 发明人 QUNYING LIN;KIM TAN SIA;CHOO HSIA LIANG-
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