发明名称 |
PHASE SHIFTING PHOTOLITHOGRAPHY SYSTEM |
摘要 |
<p>A phase shifting photolithography system includes inserting a phase shift component in a path of an illumination, wherein the phase shift component modifies a portion of the illumination to a different, and controlling an aperture shutter of the phase shift component modifying an interference of the illumination and the illumination with the different phase.</p> |
申请公布号 |
SG134265(A1) |
申请公布日期 |
2007.08.29 |
申请号 |
SG20070002769 |
申请日期 |
2007.01.16 |
申请人 |
CHARTERED SEMICONDUCTOR MANUFACTURING LTD. |
发明人 |
QUNYING LIN;KIM TAN SIA;CHOO HSIA LIANG- |
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代理机构 |
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