发明名称 |
COATING SOLUTION FOR FORMATION OF LOW REFRACTIVE COATING FILM, PROCESS FOR PRODUCTION THEREOF, AND ANTI-REFLECTION MATERIAL |
摘要 |
<p>Disclosed is a coating solution for the coating film formation, which can be cured at a low temperature even on a substrate having a high water contact angle and enables to form a coating film having high light permeability, high hardness, excellent scratch resistance and a low refractivity. Also disclosed is a process for producing the coating solution. Further disclosed is an anti-reflection material prepared by using the coating film. Specifically disclosed is a coating solution for forming a low refractive coating film, which comprises (A) a polysiloxane having a silicon atom to which a fluorinated organic group is attached, (B) a long-chain amine compound having 9 to 20 carbon atoms, and (C) an organic solvent in which the polysiloxane (A) and the long-chain amine compound (B) are dissolved.</p> |
申请公布号 |
WO2008044742(A1) |
申请公布日期 |
2008.04.17 |
申请号 |
WO2007JP69882 |
申请日期 |
2007.10.11 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD.;TANI, YOSHIHIRO;MOTOYAMA, KENICHI |
发明人 |
TANI, YOSHIHIRO;MOTOYAMA, KENICHI |
分类号 |
C09D183/08;C09D5/00;C09D7/12;C09D183/02 |
主分类号 |
C09D183/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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