发明名称 COATING SOLUTION FOR FORMATION OF LOW REFRACTIVE COATING FILM, PROCESS FOR PRODUCTION THEREOF, AND ANTI-REFLECTION MATERIAL
摘要 <p>Disclosed is a coating solution for the coating film formation, which can be cured at a low temperature even on a substrate having a high water contact angle and enables to form a coating film having high light permeability, high hardness, excellent scratch resistance and a low refractivity. Also disclosed is a process for producing the coating solution. Further disclosed is an anti-reflection material prepared by using the coating film. Specifically disclosed is a coating solution for forming a low refractive coating film, which comprises (A) a polysiloxane having a silicon atom to which a fluorinated organic group is attached, (B) a long-chain amine compound having 9 to 20 carbon atoms, and (C) an organic solvent in which the polysiloxane (A) and the long-chain amine compound (B) are dissolved.</p>
申请公布号 WO2008044742(A1) 申请公布日期 2008.04.17
申请号 WO2007JP69882 申请日期 2007.10.11
申请人 NISSAN CHEMICAL INDUSTRIES, LTD.;TANI, YOSHIHIRO;MOTOYAMA, KENICHI 发明人 TANI, YOSHIHIRO;MOTOYAMA, KENICHI
分类号 C09D183/08;C09D5/00;C09D7/12;C09D183/02 主分类号 C09D183/08
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